
Includes both facility-centralized CDS and equipment-local CDS; capable of supplying concentrated solutions and can be equipped with dilution and mixing systems.
Compatible with various polishing machines such as DSP, EP, and FP.
Incorporates industry-validated critical components tailored to the characteristics of polishing slurries, such as magnetic levitation pumps, continuous level gauges, and temperature control systems.
Utilizes multiple digital instruments and detection systems for conductivity, pH meters, temperature, pressure, flow rate, empty drum detection, etc., to monitor operational conditions.
Features automatic solution preparation and replenishment; options for post-polishing recovery or direct discharge; communicates with facility MES to upload process parameters.